冠靶科技生产多种应用与半导体镀膜的高纯金属靶材，

纯度从99.995%到99.999%不等。

工业应用包括半导体、半导体晶圆、

太阳能发电、热电子等。

CTT offers many kinds of high purity sputtering targets

for semiconductor industry,

with purities ranging from 99.995% to 99.999%

Industry applications including

semiconductors, semiconductor wafer,

solar energy generation and thermo-electronis etc.